Ultrathin films of nanoscale thickness find a major application in multilayer reflective optics. By tuning the layer thickness, these layered stacks can reflect short-wavelength light from the ultraviolet to the soft X-ray range. When designed for the Extreme UV case, e.g. 13 nanometer, multilayers have enabled the sensational development of a high-resolution lithographic technology for the manufacture of integrated circuits. At the basis of this success was forefront fundamental research by the Foundation FOM and the MESA+ Institute. MESA+ has now started a new multidisciplinary research programme to study the thin film physics and chemistry of such optics. The research will take place in a brand new thin film laboratory within the MESA+ Institute for Nanotechnology (Enschede), and at Extreme UV beam lines at the lithography equipment manufacturer ASML (Veldhoven).

The interaction of high-intensity ion and photon beams with thin film surfaces is a fascinating process. It involves both ion- and photon-induced physical reactions as well as photo- and plasma chemistry at the surfaces. Essential is also the control of layer growth down to sub-nanometer precision. The experimental approach will be to isolate the individual processes and to understand and control them at the atomic and molecular level, with support of analytical methods and thin film growth set-ups. The scientific programmes at MESA+ and ASML include world-leading research activities in each of these areas, exploiting high flux photon sources and ion beam generators, equipment to study surface photochemistry from the infrared to the extreme UV, atomic-scale layer growth set-ups and surface analysis facilities, state-of-the-art (particle) inspection and diagnostics and a range of numerical tools. The research is done in close collaboration with other industrial and academic parties, including Carl Zeiss SMT, ASML, PANalytical, DEMCON, SolMateS, TNO, and various research institutes.

Further details:
http://www.universitypositions.eu