The EUV Plasma Dynamics group at ARCNL investigates a laser-produced plasma of tin-droplets, for the production of powerful extreme ultraviolet radiation at 13.5 nm. A variety of laser-based and passive spectroscopic and particle detection techniques are used to characterize the physical and chemical phenomena in the plasma build-up on a fast time scale.

The group houses state-of-the-art lab facilities at the newly established Advanced Research Center for Nanolithography (ARCNL). We offer a dynamic and open environment, and aim to provide the optimum conditions for young scientists to do exciting research, and to work on physics challenges with interesting fundamental aspects, but which may also have direct technological relevance.

The EUV Plasma Dynamics group at ARCNL has several job openings for outstanding PhD-students, with the ambition to do cutting-edge scientific research in a state-of-the-art laboratory.
Requirements

PhD candidates have (or will receive in near future) a master’s degree in physics. Affinity with plasma, atomic or optical physics is considered an advantageous benefit.

Further details:
http://www.academictransfer.com